Reaction mechanism studies on atomic layer deposition process of AlF₃

In Situ Reaction Mechanism Studies on Atomic Layer Deposition

Reaction Path Analysis for Atomic Layer Deposition Processes

In this paper, we examine the mathematical structure of thin-film deposition process reaction kinetics models with the goal of determining whether a reaction network can guarantee the self-limiting and stable growth inherent in true atomic layer deposition systems. This analysis is based on identifying reaction invariants and interpreting the chemical significance of these conserved modes. A sp...

Atomic Layer Deposition of Ru and Ruo 2 : New Process

Title of Document: Atomic Layer Deposition of Ru and RuO2: New Process Development, Fabrication of Heterostructured Nanoelectrodes, and Applications in Energy Storage Keith E. Gregorczyk, Doctor of Philosophy, 2013 Directed By: Professor Gary W. Rubloff, Minta Martin Professor of Engineering, Department of Materials Science & Engineering and Institut...

Atomic Layer Deposition of TiO

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Atomic layer deposition: an overview.